Resolution Enhancement Techniques in Optical Lithography
Alfred Kwok-Kit Wong
This tutorial summarizes optical lithography enhancement research and development over the past 20 years. Discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers.
Contents
- Foreword
- Preface
- List of symbols
- Introduction
- Optical imaging and resolution
- Modified illumination
- Optical proximity correction
- Alternating phase-shifting mask
- Attenuated phase-shift mask
- Selecting appropriate RETs
- Second-generation RETs
- Concluding remarks
- k1 conversion charts
- Bibliography
- Index
카테고리:
년:
2001
출판사:
SPIE Publications
언어:
english
페이지:
234
ISBN 10:
0819439959
ISBN 13:
9780819439956
시리즈:
SPIE Tutorial Texts in Optical Engineering Vol. TT47
파일:
PDF, 3.87 MB
IPFS:
,
english, 2001